How to save over $ 100 mln per year on lithography cost?

Maskless electron beam lithography has emerged as one of the contenders for IC manufacturing. MAPPER’s high-throughput solution provides 10 wafers-per-hour exposure units on 1 m2 for 22 nm and beyond. This article will explain how such an approach will save IC manufacturers over $ 100 mln per year on lithography cost.

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References

Order of frictions and stiffnesses…

For lumped systems consisting of different frictions and stiffnesses, there has been confusion in literature about hysteresis curves and virtual play for many decades.

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